M06800 - SEMI M68 - Test Method for Determining Wafer Near-Edge Geometry from a Measured Height Data Array Using a Curvature Metric, ZDD StdPbc-0822 and surfaces within the semiconductor

and surfaces within the semiconductor production facility

1  The purpose of this Standard is to standardize requirements for grades of hydrochloric acid used in the semiconductor industry and testing procedures to support those specifications

org in November 2010

originally published August 2011

M06800 - SEMI M68 - Test Method for Determining Wafer Near-Edge Geometry from a Measured Height Data Array Using a Curvature Metric, ZDD StdPbc-0822 and surfaces within the semiconductorWafer near edge geometry can significantly affect the yield of semiconductor device processing. Knowledge of near edge geometrical properties can help the producer and consumer determine if the dimensional characteristics of a specimen wafer satisfy given geometrical requirements. The metric, ZDD, quantifies the near edge curvature of wafers used in semiconductor device processing. Consideration should be given to the use of this or other proposed