M06800 - SEMI M68 - 測定した高さデータ配列から曲率法ZDDを使ってウェーハのエッジ近傍形状を決定するための作業方法 Revision:SEMI M68-1109 - Superseded form a complete Interoperability Specification

form a complete Interoperability Specification for the ISPM

and bare reticle stocker equipment

due to the migration to large substrate sizes in FPD production

SEMI D22-1109 (technical revision)

M06800 - SEMI M68 - 測定した高さデータ配列から曲率法ZDDを使ってウェーハのエッジ近傍形状を決定するための作業方法 Revision:SEMI M68-1109 - Superseded form a complete Interoperability Specificationglobal Silicon Wafer Committee200994global Audits and Reviews Subcommittee200910www. semi. org200911CD ROM20073200811 ZDD Referenced SEMI Standards SEMI M1 Specifications for Polished Monocrystalline Silicon Wafers SEMI M20 Practice for Establishing a Wafer Coordinate System SEMI M59 Terminology for Silicon Technology SEMI M67 Practice for Determining Wafer Near Edge Geometry from a Measured Thickness Data Array Using the ESFQR, ESFQD and ESBIR