E05410 - SEMI E54.10 - Specification for Sensor/Actuator Network Specific Device Model for an In-Situ Particle Monitor Device Revision:SEMI E54.10-0600 (Reapproved 1111) - Superseded This standard was editorially modified

This standard was editorially modified in January 2003 to reflect the withdrawal of SEMI E44

the specification defined for determining the hardness of coating film

SEMI M15 — Polished Wafer Defect Limits Table for Polished Gallium Arsenide Wafers

previously published June 2000

E05410 - SEMI E54.10 - Specification for Sensor/Actuator Network Specific Device Model for an In-Situ Particle Monitor Device Revision:SEMI E54.10-0600 (Reapproved 1111) - Superseded This standard was editorially modifiedAn in situ particle monitor (ISPM) is a device that measures and counts particles. These devices classify by size and count, particles in the environment (gaseous, liquid, or vacuum) utilizing a technique such as detecting light from a sample region of the environments space. These counts are accumulated in bins and then reported. The number of bins varies by vendor and model. This Specification specifically addresses the minimum attributes, services,