G05900 - SEMI G59 - Test Method for Measurement of Ionic Contamination on Leadframe Interleafing and the Contamination Transferred from the Interleafing to the Leadframes Revision:SEMI G59-94 (Reapproved 0302) - Superseded tetrakis(diethylamino) hafnium and tetrakis(ethylmethylamino) hafnium

tetrakis(diethylamino) hafnium and tetrakis(ethylmethylamino) hafnium which are used in the semiconductor industry for the deposition of hafnium oxide based layers by atomic layer deposition

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G05900 - SEMI G59 - Test Method for Measurement of Ionic Contamination on Leadframe Interleafing and the Contamination Transferred from the Interleafing to the Leadframes Revision:SEMI G59-94 (Reapproved 0302) - Superseded tetrakis(diethylamino) hafnium and tetrakis(ethylmethylamino) hafniumThis Test Method describes a procedure to determine the ionic contamination on leadframe interleafing and the contamination transferred from the interleafing to the leadframes using a water extraction method. This Test Method is sensitive to the following ionic species: Na+, NH4+, K+, Cl , NO3 , Br , SO42 , PO43 . Referenced SEMI StandardsNone.