MF161700 - SEMI MF1617 - Test Method for Measuring Surface Sodium, Aluminum, Potassium, and Iron on Silicon and EPI Substrates by Secondary Ion Mass Spectrometry StdTpc-Documentation/Training 1 This Standard applies to

1 This Standard applies to the determination of metal extractable impurity characteristics of high purity materials and the wetted surfaces of components and equipment used in chemical distribution systems

particles of the size of 5 to 10 nm range or low PPQ levels of metals) cannot currently be effectively measured in UPW

The format and algorithm for the Data Matrix code is based on two-dimensional symbology specified in ISO/IEC 16022

SEMI E154 — Mechanical Interface Specification for 450 mm Load Port

MF161700 - SEMI MF1617 - Test Method for Measuring Surface Sodium, Aluminum, Potassium, and Iron on Silicon and EPI Substrates by Secondary Ion Mass Spectrometry StdTpc-Documentation/Training 1 This Standard applies toNOTICE: This Document was reapproved with minor editorial changes. Secondary ion mass spectrometry (SIMS) can measure on polished silicon wafer product the following: the sodium and potassium areal densities that can affect voltage flatband shifts in integrated circuits, and, the aluminum areal density that can affect the thermal oxide growth rate. the iron areal density that can affect gate oxide integrity, minority carrier lifetime, and current